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Materials Chemistry and Physics

Volumn 129, Issue 3, 2011, Pages 802-804

Antiferromagnetic thickness dependence of blocking temperature in SFMO/SFWO multilayer

(2) Kumar, Deepak a Kaur, Davinder a

a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE (India)

Author keywords

Blocking temperature; Exchange bias field; Multilayer; PLD

Indexed keywords

ANTIFERROMAGNETICS; BLOCKING TEMPERATURE; EXCHANGE BIAS FIELD; EXCHANGE-BIAS FIELDS; FERROMAGNETS; FINITE SIZE SCALING; FUNCTIONAL DEPENDENCE; MULTI-LAYER THIN FILM; POWER LAW RELATIONSHIP; THICKNESS DEPENDENCE;

ANTIFERROMAGNETIC MATERIALS; ANTIFERROMAGNETISM; FILM PREPARATION; MULTILAYER FILMS; SINGLE CRYSTALS;

MULTILAYERS;

EID: 79960555992 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2011.05.005 Document Type: Article

Times cited : (4)

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