Stability and crossover of 71° and 109° domains influenced by the film thickness and depolarization field in rhombohedral ferroelectric thin films

Journal of Applied Physics

Volumn 110, Issue 1, 2011, Pages

  Huang, C W ^a   Chen, Z H ^a   Wang, Junling ^a   Sritharan, T ^a   Chen, Lang ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSE PIEZOELECTRIC EFFECTS; CRITICAL FILM THICKNESS; CRITICAL THICKNESS; DEPOLARIZATION FIELDS; DOMAIN PATTERN; ELASTIC ENERGY; OPEN CIRCUIT CONDITIONS;

DEPOLARIZATION; FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; PIEZOELECTRICITY;

POLARIZATION;

EID: 79960498412     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3607977     Document Type: Article

References (37)

1. J. Seidel, L. W. Martin, Q. He, Q. Zhan, Y. H. Chu, A. Rother, M. E. Hawkridge, P. Maksymovych, P. Yu, M. Gajek, N. Balke, S. V. Kalinin, S. Gemming, F. Wang, G. Catalan, J. F. Scott, N. A. Spaldin, J. Orenstein, and R. Ramesh, Nature Mater. 8, 229 (2009). 10.1038/nmat2373
2. L. W. Martin, Y.-H. Chu, M. B. Holcomb, M. Huijben, P. Yu, S.-J. Han, D. Lee, S. X. Wang, and R. Ramesh, Nano Lett. 8, 2050 (2008). 10.1021/nl801391m
3. S. Y. Yang, J. Seidel, S. J. Byrnes, P. Shafer, C. H. Yang, M. D. Rossell, P. Yu, Y. H. Chu, J. F. Scott, J. W. Ager, L. W. Martin, and R. Ramesh, Nat. Nanotechnol. 5, 143 (2010). 10.1038/nnano.2009.451
4. A. L. Roytburd, J. Appl. Phys. 83, 228 (1998). 10.1063/1.366677
5. A. L. Roytburd, J. Appl. Phys. 83, 239 (1998). 10.1063/1.366678
6. S. P. Alpay and A. L. Roytburd, J. Appl. Phys. 83, 4714 (1998). 10.1063/1.367260
7. R. Mahjoub, V. Anbusathaiah, S. P. Alpay, and V. Nagarajan, J. Appl. Phys. 104, 124103 (2008). 10.1063/1.3042222
8. J. S. Speck and W. Pompe, J. Appl. Phys. 76, 466 (1994). 10.1063/1.357097
9. N. A. Pertsev and A. G. Zembilgotov, J. Appl. Phys. 78, 6170 (1995). 10.1063/1.360561
10. N. A. Pertsev and A. G. Zembilgotov, J. Appl. Phys. 80, 6401 (1996). 10.1063/1.363659
11. V. G. Koukhar, N. A. Pertsev, and R. Waser, Phys. Rev. B 64, 214103 (2001). 10.1103/PhysRevB.64.214103
12. R. Mahjoub, S. P. Alpay, and V. Nagarajan, Phys. Rev. Lett. 105, 197601 (2010). 10.1103/PhysRevLett.105.197601
13. P.-E. Janolin, J. Mater. Sci. 44, 5025 (2009). 10.1007/s10853-009-3553-1
14. B. S. Kwak, A. Erbil, B. J. Wilkens, J. D. Budai, M. F. Chisholm, and L. A. Boatner, Phys. Rev. Lett. 68, 3733 (1992). 10.1103/PhysRevLett.68.3733
15. K. Lee and S. Baik, Annu. Rev. Mater. Res. 36, 81 (2006). 10.1146/annurev.matsci.36.090804.094613 (Pubitemid 44476826)
16. P. Wurfel and I. P. Batra, Phys. Rev. B 8, 5126 (1973). 10.1103/PhysRevB.8.5126
17. R. V. Wang, D. D. Fong, F. Jiang, M. J. Highland, P. H. Fuoss, C. Thompson, A. M. Kolpak, J. A. Eastman, S. K. Streiffer, A. M. Rappe, and G. B. Stephenson, Phys. Rev. Lett. 102, 047601 (2009). 10.1103/PhysRevLett.102.047601
18. A. Kopal, T. Bahnik, and J. Fousek, Ferroelectrics 202, 267 (1997). 10.1080/00150199708213485
19. R. R. Mehta, B. D. Silverman, and J. T. Jacobs, J. Appl. Phys. 44, 3379 (1973). 10.1063/1.1662770
20. J. Junquera and P. Ghosez, Nature 422, 506 (2003). 10.1038/nature01501 (Pubitemid 36433642)
21. M. F. Chisholm, W. Luo, M. P. Oxley, S. T. Pantelides, and H. N. Lee, Phys. Rev. Lett. 105, 197602 (2010). 10.1103/PhysRevLett.105.197602
22. S. K. Streiffer, C. B. Parker, A. E. Romanov, M. J. Lefevre, L. Zhao, J. S. Speck, W. Pompe, C. M. Foster, and G. R. Bai, J. Appl. Phys. 83, 2742 (1998). 10.1063/1.366632
23. A. E. Romanov, M. J. Lefevre, J. S. Speck, W. Pompe, S. K. Streiffer, and C. M. Foster, J. Appl. Phys. 83, 2754 (1998). 10.1063/1.366636
24. H. Ma, L. Chen, J. Wang, J. Ma, and F. Boey, Appl. Phys. Lett. 92, 182902 (2008). 10.1063/1.2920192 (Pubitemid 351662013)
25. C. W. Huang, Y. H. Chu, Z. H. Chen, J. Wang, T. Sritharan, Q. He, R. Ramesh, and L. Chen, Appl. Phys. Lett. 97, 152901 (2010). 10.1063/1.3499658
26. J. X. Zhang, Y. L. Li, S. Choudhury, L. Q. Chen, Y. H. Chu, F. Zavaliche, M. P. Cruz, R. Ramesh, and Q. X. Jia, J. Appl. Phys. 103, 094111 (2008). 10.1063/1.2927385 (Pubitemid 351706998)
27. Z. Chen, Z. Luo, C. Huang, Y. Qi, P. Yang, L. You, C. Hu, T. Wu, J. Wang, C. Gao, T. Sritharan, and L. Chen, Adv. Funct. Mater. 21, 133 (2011). 10.1002/adfm.201001867
28. C. W. Huang, L. Chen, J. Wang, Q. He, S. Y. Yang, Y. H. Chu, and R. Ramesh, Phys. Rev. B 80, 140101 (2009). 10.1103/PhysRevB.80.140101
29. C. M. Folkman, S. H. Baek, H. W. Jang, C. B. Eom, C. T. Nelson, X. Q. Pan, Y. L. Li, L. Q. Chen, A. Kumar, V. Gopalan, and S. K. Streiffer, Appl. Phys. Lett. 94, 251911 (2009). 10.1063/1.3152009
30. C. M. Folkman, S. H. Baek, C. T. Nelson, H. W. Jang, T. Tybell, X. Q. Pan, and C. B. Eom, Appl. Phys. Lett. 96, 052903 (2010). 10.1063/1.3298362
31. Y.-H. Chu, Q. He, C.-H. Yang, P. Yu, L. W. Martin, P. Shafer, and R. Ramesh, Nano Lett. 9, 1726 (2009). 10.1021/nl900723j
32. W. Ren and L. Bellaiche, Phys. Rev. B 82, 113403 (2010). 10.1103/PhysRevB.82.113403
33. L. Chen, J.-H. Li, J. Slutsker, J. Ouyang, and A. L. Roytburd, J. Mater. Res. 19, 2853 (2004). 10.1557/JMR.2004.0367
34. L. Chen and A. L. Roytburd, Appl. Phys. Lett. 90, 102903 (2007). 10.1063/1.2711408 (Pubitemid 46398452)
35. Y.-H. Chu, M. P. Cruz, C.-H. Yang, L. W. Martin, P.-L. Yang, J.-X. Zhang, K. Lee, P. Yu, L.-Q. Chen, and R. Ramesh, Adv. Mater. 19, 2662 (2007). 10.1002/adma.v19:18
36. L. Chen, V. Nagarajan, R. Ramesh, and A. L. Roytburd, J. Appl. Phys. 94, 5147 (2003). 10.1063/1.1610242
37. a 500.