Advanced studies of water evaporation kinetics over teflon-coated tungsten nanorod surfaces with variable hydrophobicity and morphology

Journal of Physical Chemistry C

Volumn 115, Issue 28, 2011, Pages 13804-13812

  Khedir, Khedir R ^a   Kannarpady, Ganesh K ^a   Ishihara, Hidetaka ^a   Woo, Justin ^a   Trigwell, Steve ^b   Ryerson, Charles ^c   Biris, Alexandru S ^a  

^a UNIVERSITY OF ARKANSAS AT LITTLE ROCK   (United States)

^b ASRC Aerospace   (United States)

^c Engineering Research and Development Center   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRUPT TRANSITION; CONTACT ANGLE HYSTERESIS; CONTACT LINES; DE-WETTING; EVAPORATION PROCESS; FORCE MICROSCOPY; FUNCTION OF TIME; GLANCING ANGLE DEPOSITION TECHNIQUE; NANO SCALE; NANOMORPHOLOGIES; NANOROD SURFACES; NANOSCALE MORPHOLOGY; NATURAL EVAPORATION; RADIO FREQUENCY MAGNETRON SPUTTERING; ROUGH SURFACES; SURFACE PLATFORMS; TILTING ANGLE; WATER DROPLETS; WATER EVAPORATION;

CONTACT ANGLE; MORPHOLOGY; NANORODS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PHASE TRANSITIONS; SURFACE ROUGHNESS; TUNGSTEN; WETTING;

EVAPORATION;

EID: 79960384704     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp203238v     Document Type: Article

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