The evaporation and wetting dynamics of sessile water droplets on submicron-scale patterned silicon hydrophobic surfaces

Journal of Micromechanics and Microengineering

Volumn 20, Issue 5, 2010, Pages

  Shin, Dong Hwan ^a   Lee, Seong Hyuk ^a   Choi, Chang Kyoung ^b   Retterer, Scott ^c  

^a Chung Ang University   (South Korea)

^b Michigan Technological University   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAY SURFACE; DECREASE LINEARLY; DIGITAL IMAGE ANALYSIS; HYDROPHOBIC CONTACT; HYDROPHOBIC SURFACES; INITIAL CONTACT; LAST STAGE; NONLINEAR CHARACTERISTICS; PATTERNED SILICON; PATTERNED SURFACE; POLYDIMETHYLSILOXANE PDMS; SESSILE WATER; SUBMICRON DIAMETERS; SUBMICRON SCALE; TIME-DEPENDENT; WETTING DYNAMICS;

CONTACT ANGLE; DROP FORMATION; EDGE DETECTION; EVAPORATION; IMAGE ANALYSIS; SILICONES; SURFACE CHEMISTRY;

HYDROPHOBICITY;

EID: 77952004954     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/5/055021     Document Type: Article

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