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Journal of Applied Physics

Volumn 109, Issue 12, 2011, Pages

Magnetic patterning perpendicular anisotropy FePd alloy films by masked ion irradiation

(8) Merkel, D G a Bottyan L a Tanczik, F a Zolnai, Z b Nagy, N b Vertesy G b Waizinger, J b Bommer, L c

a WIGNER RESEARCH CENTRE FOR PHYSICS (Hungary)

b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE (Hungary)

c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY FILM; ATOMIC FORCE; CONVERSION ELECTRONS; FE-PD ALLOYS; FILM PLANES; IN-PLANE; MAGNETIC PATTERNING; MAGNETIC PATTERNS; MAGNETIC SOFTENING; MAGNETIC STRIPES; MAGNETO-OPTICAL KERR EFFECTS; NANOPATTERNING; OUT-OF PLANE; PERPENDICULAR ANISOTROPY; SILICA MASKS; SILICA SPHERE; SSBAUER SPECTROSCOPIES;

ATOMIC SPECTROSCOPY; EPITAXIAL FILMS; ION IMPLANTATION; IONS; IRRADIATION; KERR MAGNETOOPTICAL EFFECT; MAGNETIC DOMAINS; MAGNETIC FORCE MICROSCOPY; METALLIC FILMS; MOLYBDENUM; MONOLAYERS; NEON; OPTICAL KERR EFFECT; PALLADIUM; SILICA; SPHERES;

MAGNETIC ANISOTROPY;

EID: 79960201115 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3596535 Document Type: Article

Times cited : (26)

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