Fast backscattering parameter determination in e-beam lithography with a modified doughnut test

Microelectronic Engineering

Volumn 86, Issue 12, 2009, Pages 2408-2411

  Keil, Katja ^a   Hauptmann, Marc ^a   Choi, Kang Hoon ^b   Kretz, Johannes ^b   Eng, Lukas M ^c   Bartha, Johann W ^c  

^a Fraunhofer Center Nanoelectronic Technologies   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^c DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Backscattering; Doughnut test; E beam; Proximity effect correction

Indexed keywords

CONVENTIONAL METHODS; DOUGHNUT TEST; E-BEAM; E-BEAM LITHOGRAPHY; ELECTRON BACKSCATTERING; FEATURE SIZES; PARAMETER DETERMINATION; PROXIMITY EFFECT CORRECTION; RESIST SYSTEMS;

BACKSCATTERING; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; SCANNING ELECTRON MICROSCOPY; TESTING;

PARAMETER ESTIMATION;

EID: 70349781897     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.05.002     Document Type: Article

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