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Volumn , Issue , 2011, Pages 249-254

Manufacturing variability analysis in carbon nanotube technology: A comparison with bulk CMOS in 6T SRAM scenario

Author keywords

[No Author keywords available]

Indexed keywords

6T-CELL; 6T-SRAM; BULK CMOS; CARBON NANOTUBE FIELD EFFECT TRANSISTORS; CARBON NANOTUBE TECHNOLOGY; CIRCUIT LEVELS; DEVICE PARAMETERS; LIMITING FACTORS; MANUFACTURING VARIABILITY; METALLIC CARBON NANOTUBES; NANO SCALE; NANOTUBE DIAMETERS; PARAMETER VARIABILITY; POTENTIAL CAPABILITY; STATIC RANDOM ACCESS MEMORY; VARIABILITY MODEL;

EID: 79959977724     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/DDECS.2011.5783088     Document Type: Conference Paper
Times cited : (7)

References (11)
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  • 3
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  • 5
    • 0037101343 scopus 로고    scopus 로고
    • Detailed analysis of the mean diameter and diameter distribution of single-wall carbon nanotubes from their optical response
    • X. Liu et al., "Detailed analysis of the mean diameter and diameter distribution of single-wall carbon nanotubes from their optical response," Phys. Rev. B, vol. 66, no. 4, 2002.
    • (2002) Phys. Rev. B , vol.66 , Issue.4
    • Liu, X.1
  • 7
    • 59049086559 scopus 로고    scopus 로고
    • Circuit-level performance benchmarking and scalability analysis of carbon nanotube transistor circuits
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  • 8
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  • 9
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.