Deposition of amino-rich coatings by RF magnetron sputtering of Nylon: In-situ characterization of the deposition process

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Kylian O ^a   Kousal, J ^a   Artemenko, A ^a   Choukourov, A ^a   Petr, M ^a   Polonskyi, O ^a   Slavinska, D ^a   Biederman, H ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Amino rich coatings; Mass spectrometry; Optical emission spectroscopy; Plasma polymers; XPS

Indexed keywords

AMINO-RICH COATINGS; CHAIN FRAGMENTS; CHEMICAL COMPOSITIONS; DEPOSITION PROCESS; GASEOUS SPECIES; IN-SITU CHARACTERIZATION; OPERATIONAL CONDITIONS; OPERATIONAL PARAMETERS; OPTICAL EMISSIONS; PLASMA COMPOSITION; PLASMA POLYMERS; RF-MAGNETRON SPUTTERING; WORKING GAS; XPS ANALYSIS;

COATINGS; CYANIDES; DEPOSITION RATES; EMISSION SPECTROSCOPY; GAS MIXTURES; GASES; MAGNETRON SPUTTERING; MASS SPECTROMETRY; MIXTURES; NITROGEN; NITROGEN PLASMA; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; POLYAMIDES; POLYMERIC FILMS; RAYON; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 79959794239     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.01.036     Document Type: Article

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