Investigations on the influence of hygroscopic surfaces on the plasma-assisted modification of polyamide

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Michaeli, Walter ^a   Von Fragstein, Friederike ^a   Bahroun, Karim ^a   Behm, Henrik ^a   Hopmann, Christian ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

AFM; FT IR; HMDSO; Oxygen plasma; Polyamide; Water absorption

Indexed keywords

AFM; CHEMICAL COMPOSITIONS; DOWN-STREAM PLASMAS; DRY SUBSTRATES; ETCHING PROCESS; FT-IR; HMDSO; MOIST SURFACES; OXYGEN PLASMA; OXYGEN PLASMAS; PLASMA PROCESS; POLYAMIDE 6; PRESENCE OF WATER;

DRIERS (MATERIALS); OXYGEN; PLASMA POLYMERIZATION; SILICON COMPOUNDS; SUBSTRATES; SURFACE PROPERTIES; WATER ABSORPTION;

PLASMAS;

EID: 79959772806     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.091     Document Type: Article

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