Role of the Solvent Employed for the cathodic-Electrophoretic Deposition (EPD) of ITO/TiO2 films, over its morphology, electronic properties and photoelectrochemical behavior

ECS Transactions

Volumn 29, Issue 1, 2010, Pages 183-192

  Acevedo Peña, Próspero ^a   Manriquez J ^b   González, Ignacio ^a  

^a DEPARTAMENTO DE QUÍMICA   (Mexico)

^b CENTRO DE INVESTIGACIÓN Y DESARROLLO TECNOLÓGICO EN ELECTROQUÍMICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS MEDIUM; DONOR DENSITY; FILM MORPHOLOGY; FLAT BAND POTENTIAL; NEGATIVE VALUES; ORGANIC MEDIUM; PHOTOELECTROCHEMICAL BEHAVIOR; PHOTOVOLTAGES; SECONDARY REACTIONS; SEMICONDUCTIVE PROPERTIES; SURFACE EXCESS; TIO; TRAP STATE;

AGGLOMERATION; DEPOSITION; ELECTRIC FIELDS; ELECTRIC PROPERTIES; ELECTRONIC PROPERTIES; ELECTROPHORESIS; MORPHOLOGY; TITANIUM DIOXIDE;

SOLVENTS;

EID: 79959660432     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3532316     Document Type: Conference Paper

References (21)

1. C.C. Chen, W.D Jehng, L.L. Li and E.W.-G. Diau, J. Electrochem. Soc., 156, C304 (2009).
2. A.K. Seferlis and S.G. Neophytides, ECS T., 25, 63 (2010).
3. H.G. Oliveira, D.C. Nery and C. Long, Appl. Catal. B., 93, 205 (2010).
4. J. Xiong, S.N. Das, S. Kim, J. Lim, H. Choi and J.-M. Myoung, 204, 3436 (2010).
5. T. Bak, J. Nowotny, M. Rekas and C.C. Sorrell, Int. J. Hydrogen Energy, 27, 991 (2002).
6. S. Kment, H. Kmentova, P. Kluson, J. Krysa, Z. Hubicka, V. Cirkva, I. Gregora, O. Solcova and L. Jastrabik, J. Colloid Interface Sci., 348, 198 (2010).
7. K. Fan, M. Liu, T. Peng, L. Ma and K. Dai, Renew. Energy, 35, 555 (2010).
8. E. Dorjpalam, M. Takahashi and T. Yoko, J. Electrochem. Soc., 153, G534 (2006).
9. G. Waldner and J. Krýsa, Electrochim. Acta, 50, 4498 (2005).
10. T. Lana-Villarreal, J. Bisquert, I. Morá-Seró and P. Salvador, J. Phys. Chem. B., 109, 10355 (2005).
11. J. Manríquez and L. Godínez, Thin Solid Films, 515, 3402 (2007).
12. L. Besra and M. Liu, Prog. Mater. Sci., 52, 1 (2007).
13. P. Acevedo-Peña, G. Vázquez, D. Laverde, J.E. Pedraza-Avella, J. Manríquez and I. González, J. Electrochem. Soc., 156, C377 (2009).
14. D. Zhitomirsky, J.A. Roether, A.R. Boccaccini and I. Zhitomirsky, J. Mater. Process. Technol, 209, 1853 (2009).
15. F. Fabrgat-Santiago, G. Garcia-Belmonte, J. Bisquert, P. Bogdanoff and A. Zaban, J. Electrochem. Soc., 150, E293 (2003).
16. F.Y. Oliva, L.B. Avalle, E. Santos and O.R. Cámara, J. Photochem. Photobiol. A, 146, 175 (2002).
17. L.-Q. Mao, Q.-L. Li and Z.-J. Zhang, Sol. Energy, 81, 1280 (2007).
18. S. Kang, D. Kim and K.J. Kim, J. Electrochem. Soc., 145, 1982 (1998).
19. X. Quian, D. Quin, Q. Song, Y. Bai, T. Li, X. Tang, E. Wang and S. Dong, Thin Solid Films, 385, 152 (2001).
20. D. Jiang, H. Zhao, S. Zhang and R. John, J. Phys. Chem. B, 107, 12774 (2003).
21. K. Schwarzburg and F. Willig, Appl. Phys. Lett., 58, 2520 (1991).