Review of silicon nanowire oxidation

ECS Transactions

Volumn 34, Issue 1, 2011, Pages 535-540

  Shi, X ^a   Kurstjens, R ^a   Vos, I ^a   Everaert, J L ^a   Schaekers, M ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

IN-SITU STEAM GENERATION; NANOELECTRONIC APPLICATIONS; OXIDATION RATES; OXIDE THICKNESS; SILICON NANOWIRES; TEMPERATURE DEPENDENCE; THERMAL OXIDATION BEHAVIOR; TOPDOWN;

NANOWIRES; OXIDATION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

SILICON OXIDES;

EID: 79959649259     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3567632     Document Type: Conference Paper

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