Promotion of L10 ordering in Pt-rich nonepitaxially grown FePt films

Materials Letters

Volumn 65, Issue 17-18, 2011, Pages 2589-2591

  Li, Y L ^a   Feng, T F ^a   Chen, Q ^a   Huang, A P ^a   Chen, Z Y ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

Magnetic recording materials; Phase transformation; Sputtering; Thin films

Indexed keywords

ANNEALING; FILM PREPARATION; FILMS; MULTILAYER FILMS; PHASE TRANSITIONS; SPUTTERING; SUBSTRATES; THIN FILMS;

ATOMIC DIFFUSIONS; IN-PLANE COERCIVITY; LATTICE EXPANSION; MAGNETIC RECORDING MATERIALS; ORDERING PROCESS; POST ANNEALING; QUARTZ GLASS SUBSTRATES; STOICHIOMETRIC COMPOSITIONS;

PLATINUM;

EID: 79959570612     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2011.05.104     Document Type: Article

References (20)

1. Weller D, Moser A, Folks L, Best ME, Lee W, Toney MF, et al. IEEE Trans Magn 2000;36:10-5.
2. Ding YF, Chen JS, Lim BC, Hu JF, Liu B, Ju G. Appl Phys Lett 2008;93:032506.
3. Yan ML, Powers N, Sellmyer DJ. J Appl Phys 2003;93:8292-4.
4. Li YB, Lou YF, Zhang LR, Ma B, Bai JM, Wei FL. J Magn Magn Mater 2010;322: 3789-91.
5. Feng C, Li B, Han G, Teng J, Jiang Y, Liu Q, et al. Appl Phys Lett 2006;88:232109.
6. Sun SH, Murray CB, Weller D, Folks L, Moser A. Science 2000;287:1989-92.
7. Watanabe M, Homma M, Masumoto T. J Magn Magn Mater 1998;177-181: 1231-2.
8. Tomoyuki M, Tadashi K, Akira K, Toshihiko N, Jun-ichi A. Appl Phys Lett 2002;80: 2147-9.
9. Lee S, Yang S, Kim YK, Na JG. Appl Phys Lett 2001;78:4001-3.
10. Zhu Y, Cai JW. Appl Phys Lett 2005;87:032504.
11. Lai CH, Wu YC, Chiang CC. J Appl Phys 2005;97:10H305.
12. Endo Y, Kikuchi N, Kitakami O, Shimada Y. J Appl Phys 2001;89:7065-7.
13. Lai CH, Yang CH, Chiang CC. Appl Phys Lett 2003;83:4550-2.
14. Klemmer TJ, Shukla N, Liu C, Wu XW, Svedberg EB, Mryasov O, et al. Appl Phys Lett 2002;81:2220-2.
15. Sun SH, Fullerton EE, Weller D, Murray CB. IEEE Trans Magn 2001;37:1239-43.
16. Seki T, Shima T, Takanashi K, Takahashi Y, Matsubara E, Hono K. Appl Phys Lett 2003;82:2461-3.
17. Li BH, Feng C, Yang T, Teng J, Zhai ZH, Yu GH, et al. J Phys D Appl Phys 2006;39: 1018-21.
18. Kawai K, Honda S, Sugiki R, Komatsu M, Kawabata K. J Magn Magn Mater 2005;287:214-8.
19. Roberts BW. Acta Metallurgica 1954;2:597-603.
20. Endo Y, Kikuchi N, Kitakami O, Shimada Y. J Appl Phys 2001;89:7065-7.