Low-temperature ordering and enhanced coercivity of L10 -FePt thin film promoted by a Bi underlayer

Applied Physics Letters

Volumn 88, Issue 23, 2006, Pages

  Feng, Chun ^a   Li, Bao He ^a   Han, Gang ^a   Teng, Jiao ^a   Jiang, Yong ^a   Liu, Quan Lin ^a   Yu, Guang Hua ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COERCIVE FORCE; DIFFUSION; MAGNETIC PROPERTIES; MAGNETIZATION; THERMAL EFFECTS; THIN FILMS;

BI UNDERLAYERS; REMNANT MAGNETIZATION;

IRON COMPOUNDS;

EID: 33745066681     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2211052     Document Type: Article

References (17)

1. M. F. Toney, W. Y. Lee, J. A. Hedstrorm, and A. Kellock, J. Appl. Phys. 93, 9902 (2003).
2. C. M. Kuo, P. C. Kuo, H. C. Wu, Y. D. Yao, and C. H. Lin, J. Appl. Phys. 85, 4886 (1999).
3. T. Shima, T. Moriguchi, S. Mitani, and K. Takanashi, Appl. Phys. Lett. 80, 288 (2002).
4. D. Ravelosona, C. Chappert, V. Mathet, and H. Bernas, Appl. Phys. Lett. 76, 236 (2000).
5. T. Maeda, T. Kai, A. Kikitsu, T. Nagase, and J. I. Akiyama, Appl. Phys. Lett. 80, 2147 (2002).
6. S. R. Lee, S. Yang, Y. K. Kim, and J. G. Na, Appl. Phys. Lett. 78, 4001 (2001).
7. Y. F. Xu, J. S. Chen, and J. P. Wang, Appl. Phys. Lett. 80, 3325 (2002).
8. Y. N. Hsu, S. Jeong, D. E. Laughlin, and D. N. Lambeth, J. Appl. Phys. 89, 7068 (2001).
9. Z. L. Zhao, J. Ding, K. Inaba, J. S. Chen, and J. P. Wang, Appl. Phys. Lett. 83, 2196 (2003).
10. R. Wood, IEEE Trans. Magn. 0018-9464 10.1109/20.824422 36, 36 (2000); M. L. Yan, Y. F. Xu, X. Z. Li, and D. J. Sellmyer, J. Appl. Phys. 97, 10H309 (2005).
11. R. Wood, IEEE Trans. Magn. 0018-9464 10.1109/20.824422 36, 36 (2000); M. L. Yan, Y. F. Xu, X. Z. Li, and D. J. Sellmyer, J. Appl. Phys. 97, 10H309 (2005).
12. G. H. Yu, M. H. Li, F. W. Zhu, H. W. Jiang, W. Y. Lai, and C. L. Chai, Appl. Phys. Lett. 82, 94 (2003).
13. D. J. Sellmyer, C. P. Luo, M. L. Yan, and Y. Liu, IEEE Trans. Magn. 37, 1286 (2001).
14. O. Kitakami, Y. Shimada, K. Oikawa, H. Daimon, and K. Fukamichi, Appl. Phys. Lett. 78, 1104 (2001).
15. Y. Endo, N. Kikuchi, O. Kitakami, and Y. Shimada, J. Appl. Phys. 89, 7065 (2001).
16. B. D. Cullity and S. R. Stock, Elements of X-Ray Diffraction, 3rd ed. (Prentice Hall, Englewood Cliffs, NJ, 2001).
17. J. Wan, S. Stoyanov, Y. Huang, Y. Zhang, G. Hadjipanayis, V. Skumryev, and D. Weller, J. Magn. Magn. Mater. 272-276, 1625 (2004).