Origin of the refractive index modification of femtosecond laser processed doped phosphate glass

Journal of Applied Physics

Volumn 109, Issue 9, 2011, Pages

  Ferrer, Andrés ^a   Jaque, Daniel ^b   Siegel, Jan ^a   La Cruz, Alexandro Ruiz De ^a   Solís, Javier ^a  

^a CSIC   (Spain)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERISTIC EMISSION; CO-DOPED; CRYSTAL FIELDS; DENSITY CHANGE; DOPANT IONS; EMISSION PROCESS; ERBIUM-YTTERBIUM; FEMTO-SECOND LASER; LOCAL PERTURBATION; LOW REPETITION RATE; MATRIX DENSITY; MEAN DISTANCES; MICROFLUORESCENCE; NEGATIVE REFRACTIVE INDEX; PHOSPHATE GLASS; PHOTOLUMINESCENCE EMISSION; RED SHIFT; REFRACTIVE-INDEX MODIFICATION; SPECTRAL PEAK POSITIONS; TRANSFER MECHANISMS; YTTERBIUM ION;

DOPING (ADDITIVES); ENERGY TRANSFER; ERBIUM; GLASS; GLASS LASERS; LIGHT REFRACTION; PHOTOLUMINESCENCE; REFRACTOMETERS; SEMICONDUCTOR QUANTUM WELLS; ULTRASHORT PULSES; YTTERBIUM;

REFRACTIVE INDEX;

EID: 79959513790     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3572268     Document Type: Article

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