In situ assessment and minimization of nonlinear propagation effects for femtosecond-laser waveguide writing in dielectrics

Journal of the Optical Society of America B: Optical Physics

Volumn 27, Issue 8, 2010, Pages 1688-1692

  Ferrer, Andrés ^a   Ruiz De La Cruz, Alexandro ^a   Puerto, Daniel ^a   Gawelda, Wojciech ^a   Vallés, Juan A ^b   Rebolledo, Miguel A ^b   Berdejo, Víctor ^b   Siegel, Jan ^a   Solis, Javier ^a  

^a INSTITUTO DE ÓPTICA   (Spain)

^b UNIVERSITY OF ZARAGOZA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC LOSSES; LINEAR TRANSFORMATIONS; OPTICAL WAVEGUIDES; OPTIMIZATION; PULSED LASER APPLICATIONS; REFRACTIVE INDEX; WAVEGUIDES;

DIRECT LASER WRITING; FEMTOSECONDS; FOCAL VOLUME; GUIDED MODES; IN-SITU; IN-SITU ASSESSMENT; LASER WAVEGUIDES; LINEAR PROPAGATION REGIME; LOW PULSE ENERGY; NONLINEAR PROPAGATION; NONLINEAR PROPAGATION EFFECT; OPTIMAL CONDITIONS; PHOSPHATE GLASS; PLASMA EMISSION IMAGING; PROPAGATION LOSS; REFRACTIVE INDEX CHANGES; REPETITION RATE; SINGLE SCAN; STRUCTURAL TRANSFORMATION; WRITING BEAMS;

IN SITU PROCESSING;

EID: 77955801097     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.27.001688     Document Type: Article

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