Fabrication of ZnO films alloyed with LiGaO2 by rf-magnetron sputtering and their optical property

Japanese Journal of Applied Physics

Volumn 50, Issue 6 PART 1, 2011, Pages

  Omata, Takahisa ^a   Tanaka, Keizo ^a   Otsuka Yao matsuo, Shinya ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; BAND GAPS; CONCENTRATION FILMS; CONDUCTION ELECTRONS; DEPOSITION CONDITIONS; ENERGY BANDGAPS; NEAR INFRARED REGION; RF-MAGNETRON SPUTTERING; RF-POWER; SPUTTERING ATMOSPHERE; TARGET MATERIALS; TRANSMISSION SPECTRUMS; WURTZITE PHASE; ZNO; ZNO FILMS;

ALLOYING; ENERGY GAP; OPTICAL PROPERTIES; ZINC OXIDE; ZINC SULFIDE;

FILMS;

EID: 79959465695     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.061102     Document Type: Article

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