Phase segregation of polymethylsilsesquioxane in antireflection coatings

Macromolecules

Volumn 44, Issue 12, 2011, Pages 4872-4878

  Chuang, Wen Pin ^a,b   Sheen, Yuung Ching ^a   Wei, Su Mei ^a   Teng, Chih Chun ^b   Yen, Ming Yu ^b   Ma, Chen Chi M ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION TO SUBSTRATE; ANTI REFLECTIVE COATINGS; CAGE STRUCTURES; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; FILM FORMATIONS; FILM SURFACES; FLUORINE ATOMS; FTIR ANALYSIS; INCIDENT LIGHT; METHYLTRIMETHOXYSILANE; PHASE SEGREGATIONS; SINGLE LAYER; TETRAETHOXYSILANES; WATER CONTACT ANGLE;

ATOMIC SPECTROSCOPY; COATINGS; CONTACT ANGLE; ENERGY DISPERSIVE SPECTROSCOPY; FLUORINE; GELS; GRAFTING (CHEMICAL); HEAT RESISTANCE; PHASE SEPARATION; REFLECTION; SOL-GEL PROCESS; SOL-GELS; SOLS; SURFACE SEGREGATION;

ANTIREFLECTION COATINGS;

EID: 79959457505     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma200722x     Document Type: Article

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