Influence of deposition conditions on the optical properties of erbium-doped yttrium oxide films grown by aerosolUV assisted MOCVD

Journal of Luminescence

Volumn 131, Issue 11, 2011, Pages 2311-2316

  Salhi, Rached ^a,b   Maalej, Ramzi ^c   Fourati, Mohieddine ^b   Guyot, Yannick ^d   Chaix Pluchery, Odette ^a   Rapenne, Laetitia ^a   Jimenez, Carmen ^a   Deschanvres, Jean Luc ^a  

^a LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

^b UNIVERSITY OF SFAX   (Tunisia)

^c University of Sfax   (Tunisia)

^d UNIVERSITÉ LYON 1   (France)

Author keywords

CVD process; Films; Luminescence properties; Y2O3

Indexed keywords

AIR HUMIDITY; ANNEALED FILMS; CARRIER GAS; CHEMICAL VAPOUR DEPOSITION; CUBIC STRUCTURE; CVD PROCESS; DEPOSITION CONDITIONS; ERBIUM DOPED; LOW ORGANIC CONTAMINATIONS; LUMINESCENCE PROPERTIES; LUMINESCENT PROPERTY; METAL-ORGANIC; MONOCLINIC STRUCTURES; STRUCTURAL PHASIS; UP-CONVERSION;

ANNEALING; CHEMICAL VAPOR DEPOSITION; ERBIUM; INFRARED SPECTROSCOPY; LUMINESCENCE; OPTICAL PROPERTIES; ORGANIC CHEMICALS; STRUCTURAL PROPERTIES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; YTTRIUM; YTTRIUM OXIDE;

OXIDE FILMS;

EID: 79959272429     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2011.05.058     Document Type: Article

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