Lithography and layout co-optimization beyond conventional OPC concept

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Tsujita, Koichiro ^a   Mikami, Koji ^a   Ishii, Hiroyuki ^a   Arai, Tadashi ^a   Takahashi, Kazuhiro ^b  

^a Measurement Systems and Technology Development Center   (United States)

^b CANON INC   (Japan)

Author keywords

co optimization; illumination; layout; OPC; optimization; SMO; source

Indexed keywords

ENGINEERING; LIGHTING; MOLECULAR PHYSICS; OPTIMIZATION;

CO-OPTIMIZATION; LAYOUT; OPC; SMO; SOURCE;

LITHOGRAPHY;

EID: 79959196890     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.846264     Document Type: Conference Paper

References (5)

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5. Valery Axelrad, " 16 nm with 193-nm immersion lithography and double exposure," Proc. SPIE 7641, (2010).