|
Volumn 5379, Issue , 2004, Pages 39-46
|
Manufacturability of the X Architecture at the 90-nanometer technology node
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CHIP VALIDATION;
CRITICAL DIMENSIONS;
METAL PITCHES;
WAFER PROCESSING;
COPPER;
INTEGRATED CIRCUITS;
INTEGRATION;
MULTILAYERS;
PHOTOLITHOGRAPHY;
SCANNING;
NANOSTRUCTURED MATERIALS;
|
EID: 2942644477
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.536027 Document Type: Conference Paper |
Times cited : (2)
|
References (12)
|