Polymer layers by initiated chemical vapor deposition for thin film gas barrier encapsulation

Thin Solid Films

Volumn 519, Issue 14, 2011, Pages 4479-4482

  Spee, D A ^a   Bakker, R ^a   Van Der Werf, C H M ^a   Van Steenbergen, M J ^b   Rath, J K ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Atomic hydrogen; Initiated CVD; Inorganic organic barrier layer; Polymer film

Indexed keywords

ATOMIC HYDROGEN; DEPOSITION CONDITIONS; FILAMENT TEMPERATURE; GAS BARRIER; HIGH DEPOSITION RATES; HIGH MOLECULAR WEIGHT; INITIATED CVD; INORGANIC/ORGANIC BARRIER LAYER; PERMEATION BARRIERS; POLY(GLYCIDYL METHACRYLATE); POLYMER LAYERS; SENSITIVE ELECTRONIC DEVICES;

ACRYLIC MONOMERS; ATOMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; GAS PERMEABLE MEMBRANES; HYDROGEN; POLYMER FILMS; POLYMERS; SILICON NITRIDE; SURFACE ROUGHNESS; TUNGSTEN;

DEPOSITION;

EID: 79958838360     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.297     Document Type: Conference Paper

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