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Volumn 51, Issue 7, 2011, Pages 1166-1171

Investigation of high-performance sub-50 nm junctionless nanowire transistors

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DRIVES; DOPING CONCENTRATION; ELECTRICAL CHARACTERISTIC; FIN THICKNESS; FIN WIDTHS; GATE LENGTH; GATE OXIDE THICKNESS; GATE WORK FUNCTION; NANOWIRE TRANSISTORS; PHYSICAL PARAMETERS; SOURCE AND DRAINS; SUB-50 NM; TECHNICAL REQUIREMENT; TECHNOLOGY NODES; VARIABLE PARAMETERS;

EID: 79958134148     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2011.02.016     Document Type: Conference Paper
Times cited : (37)

References (6)
  • 1
    • 66449119228 scopus 로고    scopus 로고
    • ITRS roadmap. < http://www.itrs.net >.
    • ITRS Roadmap
  • 5
    • 79958098605 scopus 로고    scopus 로고
    • www.silvaco.com.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.