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Volumn 51, Issue 7, 2011, Pages 1166-1171
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Investigation of high-performance sub-50 nm junctionless nanowire transistors
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Author keywords
[No Author keywords available]
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Indexed keywords
CURRENT DRIVES;
DOPING CONCENTRATION;
ELECTRICAL CHARACTERISTIC;
FIN THICKNESS;
FIN WIDTHS;
GATE LENGTH;
GATE OXIDE THICKNESS;
GATE WORK FUNCTION;
NANOWIRE TRANSISTORS;
PHYSICAL PARAMETERS;
SOURCE AND DRAINS;
SUB-50 NM;
TECHNICAL REQUIREMENT;
TECHNOLOGY NODES;
VARIABLE PARAMETERS;
ASPECT RATIO;
DRAIN CURRENT;
FINS (HEAT EXCHANGE);
NANOWIRES;
THRESHOLD VOLTAGE;
ELECTRIC WIRE;
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EID: 79958134148
PISSN: 00262714
EISSN: None
Source Type: Journal
DOI: 10.1016/j.microrel.2011.02.016 Document Type: Conference Paper |
Times cited : (37)
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References (6)
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