Antireflection properties and solar cell application of silicon nanostructures

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 3, 2011, Pages

  Yue, Huihui ^a   Jia, Rui ^a   Chen, Chen ^a   Ding, Wuchang ^a   Meng, Yanlong ^a   Wu, Deqi ^a   Wu, Dawei ^a   Chen, Wei ^a   Liu, Xinyu ^a   Jin, Zhi ^a   Wang, Wenwu ^a   Ye, Tianchun ^a  

^a INSTITUTE OF MICROELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC NETWORK ANALYSIS; FABRICATION; NANOWIRES; OPEN CIRCUIT VOLTAGE; PASSIVATION; REFLECTION; SILICON SOLAR CELLS; TEXTURES;

ANTI-REFLECTANCE; ANTI-REFLECTION; CHEMICAL ETCHING; FABRICATION PROCESS; FILLING FACTOR; INTERNAL QUANTUM EFFICIENCY; P-N JUNCTION; PASSIVATION LAYER; SILICON NANOSTRUCTURES; SILICON NANOWIRES; SOLAR-CELL APPLICATIONS; WAVELENGTH REGIONS;

SILICON;

EID: 79958121754     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3591344     Document Type: Article

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