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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 3, 2011, Pages

Novel postetch process to realize high quality photonic crystals in InP

(5) Shahid, N a Naureen, S a Li, M Y a Swillo, M a Anand, S a

a ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DIELECTRIC WAVEGUIDES; NANOSTRUCTURES; PHOTONIC INTEGRATION TECHNOLOGY; PLASMA ETCHING; WAVEGUIDES;

HIGH ASPECT RATIO; HIGH QUALITY; HOLE GEOMETRY; INP; LINE DEFECTS; MONOLITHIC PHOTONIC INTEGRATED CIRCUITS; OPTICAL QUALITIES; RESHAPING PROCESS; SHARP EDGES; SIDEWALL PROFILES; SPECTRAL CHARACTERISTICS; STOP-BANDS; THERMALLY DRIVEN; WAVELENGTH CHANGE;

PHOTONIC CRYSTALS;

EID: 79958096444 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3574760 Document Type: Article

Times cited : (9)

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