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Volumn 21, Issue 3 PART 3, 2011, Pages 2904-2907

The role of nucleation surfaces in the texture development of magnesium oxide during ion beam assisted deposition

Author keywords

Biaxial texture; Ion beam assisted deposition; Nucleation and growth; RHEED; Thin films

Indexed keywords

ARGON ION; BIAXIAL TEXTURES; DEPOSITION METHODS; ELECTRON BEAM EVAPORATION; IN-PLANE; IN-PLANE TEXTURE; IN-SITU; ION IRRADIATION; MAGNESIUM OXIDES; MGO FILMS; MOSAIC SPREAD; NANO-CRYSTALLINE STRUCTURES; NATIVE OXIDES; NUCLEATION AND GROWTH; PROCESS OPTIMIZATION; RHEED; SILICON SUBSTRATES; TEXTURE DEVELOPMENT;

EID: 79957969456     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2010.2089401     Document Type: Article
Times cited : (7)

References (10)
  • 2
    • 19244366079 scopus 로고    scopus 로고
    • Biaxially textured IBAD-MgO templates for YBCO-coated conductors
    • P. N. Arendt and S. R. Foltyn, "Biaxially textured IBAD-MgO templates for YBCO-coated conductors," MRS Bulletin, vol. 29, p. 543, 2004.
    • (2004) MRS Bulletin , vol.29 , pp. 543
    • Arendt, P.N.1    Foltyn, S.R.2
  • 4
    • 84859046243 scopus 로고    scopus 로고
    • Optimization of ion assist beam deposition of magnesium oxide template films during initial nucleation and growth
    • San Francisco, CA, L5.10
    • J. R. Groves, V. Matias, R. F. DePaula, L. Stan, R. H. Hammond, and B. M. Clemens, "Optimization of ion assist beam deposition of magnesium oxide template films during initial nucleation and growth," in 2010 MRS Spring Meeting, San Francisco, CA, 2010, p. L5.10.
    • (2010) 2010 MRS Spring Meeting
    • Groves, J.R.1    Matias, V.2    DePaula, R.F.3    Stan, L.4    Hammond, R.H.5    Clemens, B.M.6
  • 6
    • 0000836443 scopus 로고    scopus 로고
    • Atomic layer deposition
    • H. S. Nalwa, Ed. New York: Academic Press
    • M. Ritala and M. Leskela, "Atomic layer deposition," in Handbook of Thin Film Materials, H. S. Nalwa, Ed. New York: Academic Press, 2002, pp. 103-159.
    • (2002) Handbook of Thin Film Materials , pp. 103-159
    • Ritala, M.1    Leskela, M.2
  • 8
    • 21544445658 scopus 로고
    • Very low temperature (< 400°C) silicon molecular beam epitaxy: The role of low energy ion irradiation
    • May
    • M. V. R. Murty, H. A. Atwater, A. J. Kellock, and J. E. E. Baglin, "Very low temperature (< 400°C) silicon molecular beam epitaxy: The role of low energy ion irradiation," Applied Physics Letters, vol. 62, pp. 2566-2568, May 1993.
    • (1993) Applied Physics Letters , vol.62 , pp. 2566-2568
    • Murty, M.V.R.1    Atwater, H.A.2    Kellock, A.J.3    Baglin, J.E.E.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.