Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique

Tribology International

Volumn 44, Issue 9, 2011, Pages 980-986

  Sharma, Neha ^a   Kumar, N ^a   Sundaravel, B ^a   Panda, Kalpataru ^a   David, Wang ^b   Kamarrudin, M ^a   Dash, S ^a   Panigrahi, B K ^a   Tyagi, A K ^a   Lin, I Nan ^b   Raj, Baldev ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^b TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Coefficient of friction; Dangling bonds; Nano crystalline diamond

Indexed keywords

BOUNDARY FRACTION; COEFFICIENT OF FRICTIONS; DIAMOND COATING; HYDROGEN CONTENTS; HYDROGENATED AMORPHOUS CARBON (A-C:H); LARGE-GRAIN; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; NANOCRYSTALLINES; SILICON SUBSTRATES; SPECTRAL ANALYSIS; TRIBOLOGICAL TESTS; ULTRA-LOW FRICTION;

AMORPHOUS CARBON; AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; COATINGS; CRYSTALLINE MATERIALS; DIAMOND CUTTING TOOLS; DIAMOND FILMS; DIAMONDS; FRICTION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTRUM ANALYSIS; TRIBOLOGY;

PLASMAS;

EID: 79957900655     PISSN: 0301679X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.triboint.2011.03.028     Document Type: Article

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