Uncovering the transformations that occur during the early stages of TiO2 CVD on Si (A perspective on the article, "tiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime" by A. Sandell et al.)

Surface Science

Volumn 605, Issue 13-14, 2011, Pages 1146-

  Gladfelter, Wayne L ^a  

^a University of Minnesota   (United States)

Author keywords

Chemical vapor deposition; Polycrystalline thin films; Synchrotron radiation photoelectron spectroscopy; Titanium oxide

Indexed keywords

OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; SILICON; SYNCHROTRON RADIATION; TITANIUM DIOXIDE; TITANIUM OXIDES;

CRYSTALLINE PHASE; INTERFACIAL PHASE; POLYCRYSTALLINE THIN FILM; REACTION LIMITEDS; SI (1 1 1); SYNCHROTRON RADIATION PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 79957865816     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2011.04.027     Document Type: Short Survey

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4. A. Sandell, M.P. Andersson, M.K.-J. Johansson, P.G. Karlsson, Y. Alfredsson, J. Schnadt, H. Siegbahn, and P. Uvdal Surf. Sci. 530 2003 63