Ordered Ag nanocluster structures by vapor deposition on pre-patterned SiO2

Journal of Physics Condensed Matter

Volumn 23, Issue 22, 2011, Pages

  Numazawa, Satoshi ^a   Ranjan, Mukesh ^a,b   Heinig, Karl Heinz ^a   Facsko, Stefan ^a   Smith, Roger ^a,c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b INSTITUTE FOR PLASMA RESEARCH   (India)

^c LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AG ADATOMS; COMPUTER MODELING; DEFECT-FREE SURFACES; EVENT CLASSIFICATION; GROWTH PATTERNS; INTERATOMIC POTENTIAL; KINETIC MONTE CARLO METHODS; NANOCLUSTER STRUCTURE; OBLIQUE ANGLES; ROOM TEMPERATURE; SMALL UNDULATION; STICKING PROBABILITY; SURFACE MIGRATION; TIME-SCALES; TRANSITION BARRIER;

ADATOMS; CRYSTALLOGRAPHY; MONTE CARLO METHODS; NANOCLUSTERS; PHYSICAL VAPOR DEPOSITION; SILICON COMPOUNDS;

SILVER;

EID: 79957825731     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/23/22/222203     Document Type: Article

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