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Surface Science

Volumn 417, Issue 2-3, 1998, Pages 220-237

A Monte Carlo simulation of submonolayer homoepitaxial growth on Ag(110) and Cu(110)

(4) Mottet, C a Ferrando, R a Hontinfinde, F a,b Levi, A C a

a UNIVERSITY OF GENOA (Italy)

b UNIVERSITY OF ABOMEY CALAVI (Benin)

Author keywords

Computer simulation; Copper; Epitaxy; Growth; Silver

Indexed keywords

ACTIVATION ENERGY; AGGLOMERATION; COMPUTER SIMULATION; COPPER; CRYSTAL LATTICES; DEPOSITION; DIFFUSION; DISSOLUTION; MONTE CARLO METHODS; REACTION KINETICS; SILVER;

ANISOTROPIC ATTACHMENT; ANISOTROPIC DIFFUSION BARRIERS; ISLAND DENSITY; MORPHOLOGY TRANSITION;

EPITAXIAL GROWTH;

EID: 0032206663 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(98)00611-6 Document Type: Article

Times cited : (82)

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