Simulation research of the effect of thermal reflow processing parameters on the profile of micro-spherical structure

Advanced Materials Research

Volumn 239-242, Issue , 2011, Pages 517-523

  Jiang, Bing Yan ^a   Chen, Lei ^a   Li, Dai Bing ^a   Kirchberg, Stefan ^b  

^a CENTRAL SOUTH UNIVERSITY   (China)

^b CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Marc simulation; Micro spherical structure; Processing parameters; Thermal reflow

Indexed keywords

CYLINDRICAL SHAPES; DEFORMATION PROCESS; EXPERIMENT METHODS; HEATING TEMPERATURES; HOLDING TIME; LIGA PROCESS; MARC SIMULATION; MICRO-LENS; MICRO-SPHERICAL STRUCTURE; OPTIMUM PROCESSING; ORTHOGONAL EXPERIMENT; PROCESSING PARAMETERS; REFLOW PROCESS; SIMULATION RESEARCH; THERMAL REFLOW;

EXPERIMENTS; HEATING; HEATING RATE; PHOTORESISTS;

SPHERES;

EID: 79957818940     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.239-242.517     Document Type: Conference Paper

References (15)

1. Giboz Julien, Copponnex Thierry, Mélé Patrice. Journal of Micromechanics and Microengineering. Vol. 19(2009), p. 0168.
2. Yong-kang YU. Journal of Wuxi Institute of Commerce. Vol. 7(2007), p. 0004. In Chinese.
3. Yonghua ZHANG, Guifu DING, Jun PENG. Journal of Transducer Technology. Vol. 22(2003), p. 0060. In Chinese.
4. Wenmin Qu, Wenzel. C, Jahn. A, Zeidler. D. Optoelectronic and Microelectronic Materials Devices. Vol. 19(1998), p. 380.
5. Abraham. M, Arnold. J, Ehrfeld. W. Micromachining and Microfabrication Process Technology. Vol. 26(1995), p. 164.
6. Vestri. C, Devernay. F. Proceedings IEEE Conference on Computer Vision and Pattern Recognition. Vol. 1(2000), p. 186.
7. HyunKee Chang, YongKweon Kim. Sensors and Actuators. Vol. 84(2000), p. 342.
8. Zoran D. Popovic, Robert A. Sprague, GA. Neville Connell. Applied optics.Vol. 27(1988), p. 1281.
9. Sheng TAO. Research on the fabrication technology of micro-optic devices based on micro imprint [D]. Huazhong University of Science and Technology, 2008. In Chinese.
10. Yajun WANG, Chunsheng YANG, Jingquan LIU. Sensors and Actuators. Vol. 22(2009), p. 0015. In Chinese.
11. R. F. Shyu, C. T. Pan, S. C. Lin. Materials Science Forum. Vol. 505-507(2006), p. 595.
12. C. K. Chung, Y. Z. Hong. Microsyst Technol. Vol. 13(2007), p. 523.
13. Zhi-bin REN, Zhenwu LU. Journal of Optoelectronics Laser.Vol, 16(2005), p. 0150. In Chinese.
14. Yongshun XU. An investigation on the effect of surface tension and gravity on the profile of photoresist in reflow process [D]. National Chung Hsing University, 2009. In Chinese.
15. Hongkai Wu, Teri W. Odom, George M. Whitesides. Analytical Chemistry. Vol. 74(2002), p. 3267.