Improving the fill factor and F number of refractive microlens array by reducing developing time

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 16, Issue 2, 2005, Pages 150-154

  Ren, Zhi Bin ^a   Lu, Zhen Wu ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

F number; Melting photoresist; Reducing developing time; Refractive microlens array

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT REFRACTION; PHOTORESISTS;

F NUMBER; MELTING PHOTORESIST; REDUCING DEVELOPING TIME; REFRACTIVE MICROLENS ARRAY;

MICROLENSES;

EID: 16644394022     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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