Synthesis of bismuth oxide thin films deposited by reactive magnetron sputtering

Acta Physica Polonica A

Volumn 120, Issue 1, 2011, Pages 60-62

  Iljinas, A ^a   Burinskas, S ^a   Dudonis, J ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH; DEPOSITION; ENERGY GAP; GLASS; ION IMPLANTATION; MAGNETRON SPUTTERING; OPTICAL MATERIALS; OXIDE FILMS; REFLECTION; SPUTTERING; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS;

BISMUTH OXIDE THIN FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRO-OPTICAL CHARACTERISTICS; OPTICAL CHARACTERISTICS; REACTIVE MAGNETRON SPUTTERING; SODA LIME GLASS SUBSTRATE; TRANSMITTANCE AND REFLECTANCES; ULTRAVIOLET AND VISIBLE LIGHT SPECTROMETERS;

OPTICAL FILMS;

EID: 79957812123     PISSN: 05874246     EISSN: 1898794X     Source Type: Journal    
DOI: 10.12693/APhysPolA.120.60     Document Type: Conference Paper

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