Influences of process parameters on texture and microstructure of NiO films

Thin Solid Films

Volumn 519, Issue 15, 2011, Pages 4940-4943

  Kuo, T Y ^a   Chen, S C ^b   Peng, W C ^b   Lin, Y C ^b   Lin, H C ^a,b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

(200) texture; Glass substrate; NiO films; Process parameters; Rf magnetron sputtering

Indexed keywords

(200) TEXTURE; GLASS SUBSTRATE; NIO FILMS; PROCESS PARAMETERS; RF-MAGNETRON SPUTTERING;

LATTICE CONSTANTS; MAGNETRON SPUTTERING; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SUBSTRATES;

TEXTURES;

EID: 79957662432     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.057     Document Type: Conference Paper

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