Structures and photocatalytic behavior of tantalum-oxynitride thin films

Thin Solid Films

Volumn 519, Issue 15, 2011, Pages 4699-4704

  Hsieh, J H ^a   Li, Chuan ^b   Liang, H C ^a  

^a MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Band gap; Photocatalysis; Sputtering; Tantalum oxynitride

Indexed keywords

ABSORBANCES; BAND GAPS; BEER LAMBERT LAW; METHYLENE BLUE; OPTICAL ABSORPTION; OXYGEN FLOW; OXYNITRIDE FILMS; PHOTO-CATALYTIC; POST PROCESS; THEORETICAL CALCULATIONS; UV-VIS-NIR SPECTROPHOTOMETERS; VISIBLE LIGHT; VISIBLE LIGHT ABSORPTION; VISIBLE-LIGHT IRRADIATION;

ABSORPTION; ENERGY GAP; LIGHT ABSORPTION; NITRIDES; OXYGEN SUPPLY; PHOTOCATALYSIS; PHOTODEGRADATION; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; TANTALUM; TANTALUM COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OPTICAL FILMS;

EID: 79957638117     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.018     Document Type: Conference Paper

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