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Japanese Journal of Applied Physics

Volumn 50, Issue 5 PART 2, 2011, Pages

Application of novel ultrasonic cleaning equipment that uses the waveguide mode for the single-wafer cleaning process

(6) Suzuki, Kazunari a Imazeki, Yasuhiro a Han, Ki a Okano, Shoichi a Soejima, Junichiro a Koike, Yoshikazu b

a Kaijo Corporation (Japan)

b SHIBAURA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITATION BUBBLE; CHARGE COUPLED DEVICE CAMERA; FREQUENCY RANGES; LAMB WAVE; MEGASONICS; PARTICLE REMOVAL EFFICIENCY; PATTERN DEFECTS; PHOTORESIST FILM; SINGLE-WAFER CLEANING; TRAVELING-WAVE FIELD; ULTRASONIC CLEANING EQUIPMENT; WAFER SURFACE; WAVEGUIDE MODE;

BUBBLE FORMATION; CAVITATION; CHARGE COUPLED DEVICES; EQUIPMENT; PHOTORESISTS; REMOVAL; SEMICONDUCTOR DEVICES; SILICON WAFERS; SONOCHEMISTRY; ULTRASONIC CLEANING; ULTRASONIC WAVES; ULTRASONICS; WATER ABSORPTION; WAVEGUIDES;

CLEANING;

EID: 79957441524 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.50.05EC10 Document Type: Article

Times cited : (7)

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