Positive patterning of ferritin and fibronectin molecules on silicon by the Atomic Force Microscopic anodic oxidation technique

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 5, 2011, Pages 3808-3813

  Shanmugam, Kumaran ^a   Yoshinobu, Tatsuo ^b   Moon, Wonchul ^c   Iwasaki, Hiroshi ^d  

^a PERIYAR MANIAMMAI UNIVERSITY   (India)

^b TOHOKU UNIVERSITY   (Japan)

^c Poongsan Corporation   (South Korea)

^d OSAKA UNIVERSITY   (Japan)

Author keywords

Aminopropylmethyldiethoxysilane; Aminopropyltriethoxysliane; Anodic oxidation; Ferritin; Fibronectin; Glutaraldehyde; Octadecyltrichlorosilane

Indexed keywords

AMINOPROPYLMETHYLDIETHOXYSILANE; AMINOPROPYLTRIETHOXYSLIANE; FERRITIN; FIBRONECTIN; GLUTARALDEHYDES; OCTADECYLTRICHLOROSILANE;

ALDEHYDES; ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; SILICON COMPOUNDS;

MOLECULES;

FERRITIN; FIBRONECTIN; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRODE; METHODOLOGY; OXIDATION REDUCTION REACTION;

ELECTRODES; FERRITINS; FIBRONECTINS; MICROSCOPY, ATOMIC FORCE; OXIDATION-REDUCTION; SILICON;

EID: 79956112325     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.4171     Document Type: Conference Paper

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