New three-dimensional AFM for CD measurement and sidewall characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7971, Issue , 2011, Pages

  Hua, Yueming ^a   Buenviaje Coggins, Cynthia ^a   Lee, Yong Ha ^b   Lee, Jung Min ^b   Ryang, Kyung Deuk ^b   Park, Sang Il ^b  

^a Park Systems Inc   (United States)

^b Park Systems Corporation   (South Korea)

Author keywords

AFM; critical dimension; LER; LWR; roughness; sidewall

Indexed keywords

AFM; CRITICAL DIMENSION; LER; LWR; ROUGHNESS; SIDEWALL;

ATOMIC FORCE MICROSCOPY; IMAGE RESOLUTION; LITHOGRAPHY; PHOTORESISTS; PROCESS CONTROL; ROUGHNESS MEASUREMENT; SCANNING; UNITS OF MEASUREMENT;

THREE DIMENSIONAL;

EID: 79956094129     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879545     Document Type: Conference Paper

References (4)

1. Joonhyung Kwon, Yong-Seog Kim, Kwanseok Yoon,Sang-Min Lee, Sang-il Park, "Advanced nanoscale metrology of pole-tip recession with AFM", Ultramicroscopy 105, 51-56 (2005)
2. Bharat Bhushan, Harald Fuchs, and Masahiko Tomitori, Applied Scanning Probe Methods VIII, Springer, 31-75 (2008)
3. Sang-Joon Cho, Jung-Min Lee, Byung-Woon Ahn, Joonhui Kim, Young Yoo, Yueming Hua, Sang-il Park, "Three-dimensional imaging of undercut and sidewall structures by atomic force microscopy", Review of Scientific Instruments, 82, 023707 (2011)
4. Joonhyung Kwon, Jaewan Hong, Yong-Seok Kim, Dong-Youn Lee, Kyumin Lee, Sang-min Lee, Sang-il Park, "Atomic force microscope with improved scan accuracy, scan speed,and optical vision", Review of Scientific Instruments 74, 4378-4383 (2003)