Ferromagnetic tunnel junctions with plasma-oxidized Al barriers and their annealing effects

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 6691-6693

  Sato, M ^a   Kikuchi, H ^a   Kobayashi, K ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000490246     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367933     Document Type: Article

References (6)

1. M. Julliere, Phys. Lett. 54A, 225 (1975).
2. S. Maekawa and U. Gafvart, IEEE Trans. Magn. MAG-18, 707 (1982).
3. M. Sato and K. Kobayashi, Jpn. J. Appl. Phys., Part 2 36, L200 (1997).
4. M. Sato, H. Kikuchi, and K. Kobayashi, IEEE Trans. Magn. 33, 3553 (1997).
5. J. S. Moodera, L. R. Kinder, T. M. Wong, and R. Meservey, Phys. Rev. Lett. 74, 3273 (1995).
6. J. G. Simmons, J. Appl. Phys. 34, 2581 (1963).