SCOPUS 정보 검색 플랫폼

Chemical Vapor Deposition

Volumn 8, Issue 3, 2002, Pages 89-92

Cold atmosphere CVD: A simple method for the growth of carbon nanotubes

(5) Croci, Mirko a Bonard, Jean Marc a Noury, Olivier a Stöckli, Thomas a,b Châtelain, André a

a EPFL (Switzerland)

b CSEM (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC MEASURING BRIDGES; ELECTRODES; EMITTER COUPLED LOGIC CIRCUITS; EPITAXIAL GROWTH; HEATING; LUMINESCENT DEVICES; SCANNING;

ELECTRON EMITTERS; EMISSION SITE DENSITY; FIELD EMISSION TIPS; RESISTIVE HEATING;

NANOTUBES;

EID: 0002641858 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3862(20020503)8:3<89::AID-CVDE89>3.0.CO;2-E Document Type: Article

Times cited : (21)

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