Solid-state halogen atom source for chemical dynamics and etching

Applied Physics Letters

Volumn 81, Issue 6, 2002, Pages 1140-1142

  Hess, Wayne P ^a   Joly, Alan G ^a   Beck, Kenneth M ^a   Gerrity, Daniel P ^b   Sushko, Peter V ^c   Shluger, Alexander L ^c  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b REED COLLEGE   (United States)

^c UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM DENSITY; ATOM SOURCES; BULK ABSORPTION; CHEMICAL DYNAMICS; DENSE PLUMES; HALOGEN ATOMS; LASER-PULSE POWER; MULTIPLE PULSE; PHOTON ENERGY; RADICAL ATOMS; REACTION DYNAMICS; SURFACE ETCHING;

ALKALI HALIDES; ATOMS; DYNAMICS; ETCHING; LASER BEAM EFFECTS; LASER PULSES; PULSED LASERS; REACTION KINETICS;

BROMINE;

EID: 79956014348     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1488700     Document Type: Article

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