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Volumn 81, Issue 17, 2002, Pages 3167-3169

X-ray diffuse scattering study of the kinetics of stacking fault growth and annihilation in boron-implanted silicon

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSE SCATTERING; DISLOCATION REACTIONS; FUNCTION OF TIME; INTERSTITIAL MIGRATION; SCATTERED X-RAYS; X-RAY DIFFUSE SCATTERING;

ACTIVATION ENERGY; BORON; BORON COMPOUNDS; GROWTH KINETICS;

STACKING FAULTS;

EID: 79956004765 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1516239 Document Type: Article

Times cited : (8)

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