Optical waveguides fabricated by pulsed-laser deposition of SiO2 films with different refractive indices

Applied Physics Letters

Volumn 81, Issue 5, 2002, Pages 789-791

  Okoshi, M ^a   Kuramatsu, M ^a   Inoue, N ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE FILMS; HE-NE LASERS; SI WAFER;

DEPOSITION RATES; OPTICAL WAVEGUIDES; PULSED LASER DEPOSITION; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SILICONES; WAVEGUIDES;

PULSED LASERS;

EID: 79956003505     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1496134     Document Type: Article

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