Laser ablation of silicone rubber for fabricating SiO2 thin films

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 1 A/B, 2001, Pages

  Okoshi, M ^a   Kuramatsu, M ^a   Inoue, N ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

ArF excimer laser; Infrared spectroscopy; Laser ablation; Pulsed laser deposition (PLD); Room temperature; Silicone; SiO2 thin film; Transparency

Indexed keywords

EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXYGEN; PRESSURE EFFECTS; PULSED LASER DEPOSITION; RUBBER; SILICA; THIN FILMS; TRANSPARENCY; VACUUM TECHNOLOGY;

VACUUM ULTRAVIOLET LASERS;

SILICONES;

EID: 0035862482     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l41     Document Type: Article

References (10)