Optical properties of ZnO thin films: Ion layer gas reaction compared to sputter deposition

Applied Physics Letters

Volumn 80, Issue 19, 2002, Pages 3518-3520

  Rebien, M ^a   Henrion, W ^a   Bar M ^a   Fischer, C H ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAP ENERGY; COMPLEX REFRACTIVE INDEX; INFRARED RANGE; ION LAYER GAS REACTION; LINEAR OPTICAL PROPERTIES; LITERATURE DATA; PACKING DENSITY; RF-MAGNETRON SPUTTERING; SPECTRAL ELLIPSOMETRY; TRANSMITTANCE MEASUREMENTS; URBACH ENERGY; ZNO THIN FILM;

DEPOSITION; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SINGLE CRYSTALS; SPUTTER DEPOSITION; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

OXIDE FILMS;

EID: 79955993943     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1479211     Document Type: Article

References (31)

1. G. E. Jellison, Jr. and L. A. Boatner, Phys. Rev. B 58, 3586 (1998). prb PRBMDO 0163-1829
2. X.-L. Guo, J.-H. Choi, H. Tabata, and T. Kawai, Jpn. J. Appl. Phys., Part 2 40, L177 (2001). jjc JAPLD8 0021-4922
3. H. C. Ong, J. Y. Dai, A. S. K. Li, G. T. Du, R. P. H. Chang, and S. T. Ho, J. Appl. Phys. 90, 1663 (2001); jap JAPIAU 0021-8979
4. H. Cao, Y. Ling, J. Y. Xu, C. Q. Cao, and P. Kumar, Phys. Rev. Lett. 82, 2278 (1999). prl PRLTAO 0031-9007
5. H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, Semiconducting Transparent Thin Films (IOP, Bristol, 1995).
6. German Patent No. 198 15 161.6 pending;
7. German Patent No. 198 16 403.7 with PCT-option.
8. H.-J. Muffler, M. Bär, Ch.-H. Fischer, and M. C. Lux-Steiner, in Proc. 28th IEEE Phovoltaic Specialists Conf., Anchorage, 2000, pp. 610-613.
9. J. Möller, Ch.-H. Fischer, H.-J. Muffler, R. Könenkamp, I. Kaiser, C. Kelch, and M. C. Lux-Steiner, Thin Solid Films 361, 113 (2000). tsf THSFAP 0040-6090
10. M. Bär, H.-J. Muffler, Ch.-H. Fischer, S. Zweigart, F. Karg, and M. C. Lux-Steiner, Prog. Photovolt. 10, 173 (2002).
11. M. Bär, Ch.-H. Fischer, H.-J. Muffler, S. Zweigart, F. Karg, and M. C. Lux-Steiner, Sol. Energy Mater. Sol. Cells (to be published).
12. M. Bär, H.-J. Muffler, Ch.-H. Fischer, M. C. Lux-Steiner, Sol. Energy Mater. Sol. Cells 67, 113 (2000). ses SEMCEQ 0927-0248
13. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (Elsevier, Amsterdam, 1987).
14. B. Johs, J. A. Woollam, C. M. Herzinger, J. Hilfiker, R. Synowicky, and C. L. Bungay, SPIE Crit. Rev. Opt. Sci. Technol. CR 72, 29 (1999).
15. A. Röseler, J. Opt. Soc. Am. A 9, 1124 (1992). joa JOAOD6 0740-3232
16. C. M. Herzinger, P. G. Snyder, B. Johs, and J. A. Woollam, J. Appl. Phys. 77, 1715 (1995). jap JAPIAU 0021-8979
17. P. M. Grant and W. Paul, J. Appl. Phys. 37, 3110 (1966); jap JAPIAU 0021-8979
18. R. E. Denton, R. D. Campbell, and S. G. Tomlin, J. Phys. D 5, 852 (1972). jpd JPAPBE 0022-3727
19. G. E. Jellison, Jr., Thin Solid Films 234, 416 (1993). tsf THSFAP 0040-6090
20. B. Brixner, in Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, Orlando, 1985), pp. 759-760.
21. D. E. Aspnes, J. Opt. Soc. Am. 70, 1275 (1980). jox JOSAAH 0030-3941
22. W. L. Bond, J. Appl. Phys. 36, 1674 (1965). jap JAPIAU 0021-8979
23. E. Dumont, B. Dugnoille, and S. Bienfait, Thin Solid Films 353, 93 (1999). tsf THSFAP 0040-6090
24. Guide to Using WVASE32 (J. A. Woollam Co., Lincoln, 2001).
25. C. Tanguy, Phys. Rev. Lett. 75, 4090 (1995); prl PRLTAO 0031-9007
26. 76, 716 (1996). prl PRLTAO 0031-9007
27. K. Postava, H. Sueki, M. Aoyama, T. Yamaguchi, Ch. Ino, Y. Igasaki, and M. Horie, J. Appl. Phys. 87, 7820 (2000). jap JAPIAU 0021-8979
28. C. Tanguy, Phys. Rev. B 60, 10660 (1999). prb PRBMDO 0163-1829
29. D. E. Aspnes, in Handbook on Semiconductors, edited by M. Balkanski (North Holland, Amsterdam, 1980), Vol. 2, Chap. 4A.
30. M. V. Kurik, Phys. Status Solidi A 8, 9 (1971). psa PSSABA 0031-8965
31. V. Srikant and D. R. Clarke, J. Appl. Phys. 81, 6357 (1997). jap JAPIAU 0021-8979