ILGAR technology IV: ILGAR thin film technology extended to metal oxides

Solar Energy Materials and Solar Cells

Volumn 67, Issue 1-4, 2001, Pages 113-120

  Bar M ^a   Muffler, H J ^a   Fischer, Ch H ^a   Lux Steiner, M C ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING FILMS; SUBSTRATES; THIN FILM DEVICES; WATER; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ION LAYER GAS REACTIONS (ILGAR);

SOLAR CELLS;

EID: 0038292900     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00270-1     Document Type: Article

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