Nanoimprint process for 2.5Tb/in2 bit patterned media fabricated by self-assembling method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Ootera, Yasuaki ^a   Yuzawa, Akiko ^a   Shimada, Takuya ^a   Yamamoto, Ryousuke ^a   Kamata, Yoshiyuki ^a   Kihara, Naoko ^a   Kikitsu, Akira ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Bit patterned media; Diblock copolymer; HDD; Nanoimprint; Photopolymer; Self assembled polymer

Indexed keywords

BIT-PATTERNED MEDIA; DIBLOCK COPOLYMER; HDD; NANO-IMPRINT; SELF-ASSEMBLED;

BLOCK COPOLYMERS; ETCHING; MOLDS;

NANOIMPRINT LITHOGRAPHY;

EID: 79955886579     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.878936     Document Type: Conference Paper

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