Ion beam modification of exchange coupling to fabricate patterned media

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 3, 2011, Pages 2611-2614

  Ranjbar, Mojtaba ^a,b   Piramanayagam, S N ^a   Sbiaa, R ^a   Aung, K O ^a   Guo, Z B ^a   Chong, T C ^a,b  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Antiferromagnetically coupled media; Focused ion beam; Magnetic materials; Nanofabrication; Patterning

Indexed keywords

AFM; ANTIFERROMAGNETICALLY COUPLED MEDIA; BIT-PATTERNED MEDIA; ION BEAM IRRADIATION; ION BEAM MODIFICATION; NONMAGNETICS; PATTERNED MEDIAS; PATTERNING; PLANARIZATION TECHNIQUE; POTENTIAL METHODS; REMANENT MAGNETIZATION; STRUCTURED FILMS; SYNTHETIC ANTIFERROMAGNETIC; TRILAYERS;

COBALT; FOCUSED ION BEAMS; MAGNETIC MATERIALS; NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY;

ION BEAMS;

COPPER; ION; NANOMATERIAL; RUBIDIUM;

ARTICLE; CHEMISTRY; MAGNETISM; MATERIALS TESTING; RADIATION EXPOSURE;

COPPER; IONS; MAGNETICS; MATERIALS TESTING; NANOSTRUCTURES; RUBIDIUM;

EID: 79955853861     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.2704     Document Type: Conference Paper

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