Large area patterned magnetic nanostructures

Journal of Physics D: Applied Physics

Volumn 41, Issue 15, 2008, Pages

  Adeyeye, A O ^a   Singh, N ^a,b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; FABRICATION; FERROMAGNETISM; LITHOGRAPHY; MAGNETIC ANISOTROPY; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETISM; MAGNETIZATION; MAGNETIZATION REVERSAL; MAGNETOSTATICS; NANOSTRUCTURES; NICKEL; OPTICAL DESIGN; PHASE SHIFT; PHOTOMASKS; SPIN DYNAMICS;

ALTERNATING PHASE; ALTERNATING PSM; CHROME-LESS; DEEP ULTRAVIOLET LITHOGRAPHY; DOUBLE EXPOSURE; DOUBLE PATTERNING; FERROMAGNETIC NANOSTRUCTURES; GEOMETRICAL PARAMETERS; IN-PLANE ANISOTROPY; LATERAL DIMENSIONS; MAGNETIC NANOSTRUCTURES; MAGNETIC SPIN STATES; MAGNETIZATION REVERSAL PROCESSES; MAGNETOSTATIC INTERACTIONS; PATTERN DENSITIES; PATTERN SIZES; PHASE-SHIFT MASKING; POTENTIAL APPLICATIONS; RESOLUTION ENHANCEMENT TECHNIQUES; RESOLUTION LIMITS; SWING AMPLITUDE; SYSTEMATIC INVESTIGATIONS;

NANOSTRUCTURED MATERIALS;

EID: 49749089331     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/15/153001     Document Type: Article

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