Single exposure contacts are dead. Long live single exposure contacts!

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7974, Issue , 2011, Pages

  Haffner, Henning ^a   Ostermayr, Martin ^a   Kanai, Hideki ^a   Chang, Chan Sam ^a   Morgenfeld, Bradley ^a   An, Jujin ^a   Luo, Meng ^a   Zhuang, Haoren ^a  

^a IBM RESEARCH   (United States)

Author keywords

Double exposure (DE); Double patterning (DP); Mask optimization (MO); OPC; Single exposure (SE); SRAM

Indexed keywords

DOUBLE EXPOSURE; DOUBLE PATTERNING; MASK OPTIMIZATION (MO); OPC; SINGLE EXPOSURE (SE); SRAM;

LOGIC DESIGN; MACHINE DESIGN;

OPTIMIZATION;

EID: 79955792806     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879681     Document Type: Conference Paper

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