SCOPUS 정보 검색 플랫폼

Volumn 7973, Issue , 2011, Pages

Contact patterning strategies for 32nm and 28nm technology

Author keywords

28nm node lithography; 32nm node lithography; Contact hole patterning; Contact mapping; Double patterning; Single exposure; SRAF; Tolerance budget

Indexed keywords

28NM NODE LITHOGRAPHY; 32-NM NODE; CONTACT HOLE PATTERNING; DOUBLE PATTERNING; SINGLE EXPOSURE; SRAF; TOLERANCE BUDGET;

LITHOGRAPHY; NANOTECHNOLOGY;

TECHNOLOGY;

EID: 79955823073 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.879773 Document Type: Conference Paper

Times cited : (3)

References (7)

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4
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5
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6
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7
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.